Monday, June 23

Monday, June 23
08:30 – 08:50 Opening
Welcome Addresses
Introductory Session
Market and Business in the Field of Coatings on Glass and Plastics
Chairmen: Dr. K. Suzuki, Mr. J. Vitkala
08:50 – 09:20
Challenge of Thin Film Transistor (TFT) for flat panel: from perspective of resolution and fabrication
H.-P. D. Shieh
National Chiao Tung University [Taiwan]
09:20 – 09:50
From monolayer to millimeters. Coatings for sensors and in energy and automotive applications
C. Herweg
Corporate Research, Robert Bosch GmbH, Chemical Processes and Technology [Germany]
09:50 – 10:20
Recent developments in the field of optical coatings from XUV to IR wavelength
N. Kaiser
Fraunhofer IOF [Germany]
10:20 – 10:50 Coffee Break
10:50 – 11:20
Challenges and opportunities for thin-film solar cells to penetrate the PV market: the Solliance perspective
T. Aernouts
IMEC [Belgium]
11:20 – 11:50
OLED lighting technology and market opportunities
E. Meulenkamp
Philips Lighting, Business Center OLED Lighting [Germany]
11:50 – 12:20
A Systematic Evaluation of Flexible AMOLED Technology and Market Opportunities
C. Annis
NPD DisplaySearch [Japan]
12:20 – 13:50 Lunch
Session 1 | Deposition Technologies 1
»Advanced Plasma Processes in Vacuum«
Chairmen: Prof. G. Bräuer, Dr. J. Strümpfel
13:50 – 14:20
Concepts and challenges of large area deposition of cubic boron nitride coatings
S. Ulrich, J. Ye, M. Stüber
Karlsruhe Institute of Technology (KIT), Institut für angewandte Materialien (IAM) [Germany]
14:20 – 14:40
Whistler Wave Heated Discharges in Planar Geometry
P. Fayet¹, P. Guittienne², A. Howling³, J. Larrieu¹
¹    Tetra Pak (Suisse) SA, DSO [Switzerland]
²    Helyssen [Switzerland]
³    Ecole Polytechnique Fédérale de Lausanne, CRPP [Switzerland]
14:40 – 15:00 Moth-Eye Structures on Various Glass Substrates by Dry Etching Process using Ag Nanoparticle Masks
T. Tomizawa, T. Okato
Asahi Glass Co., Ltd. Research Center [Japan]
15:00 – 15:20 Evolving Dual Magnetron Sputtering (DMS): Strategies for Increased Control and Efficiencies
D. J. Christie¹, S. B. Larson¹, U. Krause², D. R. Pelleymounter¹
¹    Advanced Energy Industries, Inc. [USA]
²    Advanced Energy Industries GmbH [Germany]
15:20 – 15:40 Reactive Sputtering in Roll-to-Roll Coating Machines using Rotatable Magnetrons
M. Fahland¹, T. Vogt¹, M. Dimer², O. Khvostikova²
¹    Fraunhofer FEP [Germany]
²    VON ARDENNE GmbH [Germany]
15:40 – 16:00
On the Potential of Large Area PECVD
A. Schulz
University of Stuttgart, IGVP [Germany]
16:00 – 16:30 Coffee Break
16:30 – 16:50 Rotatable Serial Co-Sputtering of doped Titania
V. Sittinger¹, A. Pflug¹, W. Dewald¹, S. Jung¹, C. Britze¹, A. Kaiser¹, W. Werner¹, B. Szyszka², G. Bräuer¹
¹    Fraunhofer IST [Germany]
²    Technische Universität Berlin, Department of High-Frequency and Semiconductor System Technologies [Germany]
16:50 – 17:10 Investigations on Influences of Microstructure on Sputtering Properties of Target Materials
M. Boehling, M. Reinfried
FHR Anlagenbau GmbH [Germany]
17:10 – 17:30 Hollow cathode gas flow sputtering with plasma excitation by unipolar pulsing with reverse voltage – a novel approach for high performance compound coating
B. Szyszka¹, T. Jung², A. Klimczak³, C. von Knoblauch4, R. Muydinov¹, K. Ortner², P. Ozimek³, H. Scherg-Kurmes¹, F. Schmidt²
¹    Berlin Institute of Technology, Technology of Thin Film Device [Germany]
²    Fraunhofer IST [Germany]
³    Hüttinger Electronic Poland [Poland]
4    Hüttinger Elektronik Germany [Germany]
17:30 – 19:00 Poster Session
Discussion of the posters
Posters will be on display from Monday to Wednesday. Drinks and snacks will be served on Monday.
17:30 – 20:00 Industrial Evening
There will be the unique chance to visit important companies and institutes during this evening.

All content is subject to change without prior notice.

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