Tuesday, June 24

Tuesday, June 24
Session 2 | Deposition Technologies 2
»Wet-chemical and Hybrid Processes«
Chairmen: Dr. J. Pütz, Dr. G. Schottner
08:30 – 09:00
Towards Electrochromic Plastic Devices via Roll-to-roll Processing
U. Posset
Fraunhofer ISC [Germany]
09:00 – 09:20
High Gas Barrier Encapsulation for Flexible Devices
S. Naganawa, Y. Suzuki, K. Nishijima, Y. Hagihara, K. Nagamoto, T. Kondo
LINTEC Corp. [Japan]
09:20 – 09:40
Reactive Rotatable Cylindrical Magnetron Sputtering for Barrier and Plasmapolymerization Applications
D. Monaghan¹, V. Bellido-Gonzalez¹, B. Daniel¹, J. Brindley¹, A. Azzopardi¹, I. Sorzabal-Bellido¹,  I. Fernandez², A. Wennberg², F. Briones³
¹    Gencoa Ltd, Liverpool [United Kingdom]
²    Nano4Energy, Madrid [Spain]
³    IMM-CNM-CSIC [Spain]
09:40 – 10:00
Flexibility of gravure printed ITO coatings on foil
S. Heusing¹, P. Rogin¹, M. Lacroix², F. Hardinghaus², P. Garcia-Juan², P. W. de Oliveira¹
¹    INM-Leibniz-Institute for New Materials, Optical Materials Group [Germany]
²    Solvay Fluor GmbH [Germany]
10:00 – 10:20 Low Pressure Plasma Treatment For Curing Hybrid Layer Systems
D. Glöß¹, K. Rose², A. Drescher¹
¹    Fraunhofer FEP [Germany]
²    Fraunhofer ISC [Germany]
10:20 – 10:50 Coffee Break
Session 3 | Deposition Technologies 3
»CVD, ALD and Related Processes«
Chairmen: Prof. D. Sheel, Mr. K. Spee
10:50 – 11:20
Developments in Atomic Layer Deposition Sheet-to-Sheet and Roll-to-Roll Technology for Large-Area products on Glass and Plastics. A review on equipment and applications
K. Spee¹ ² ³, P. Poodt²
¹    Smit Ovens B.V., Son [The Netherlands]
²    Holst Centre / TNO [The Netherlands]
³    Avans University of Applied Science [The Netherlands]
11:20 – 11:40
Anti Condensation Glass
L. Pyrah, K. Harbison, D. Rimmer
NSG Pilkington Technology Centre [United Kingdom]
11:40 – 12:00 Plasma-ALD of SiO2 layers for optical applications
A. Bingel¹ ²,L. Ghazaryan¹, S. Ratzsch¹, A. Szeghalmi¹, P. Munzert², U. Schulz², N. Kaiser², A. Tünnermann¹ ²
¹    Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University [Germany]
²    Fraunhofer Institute for Applied Optics and Precision Engineering [Germany]
12:00 – 12:20 Combination of Pulse Magnetron Sputtering and Atomic Layer Deposition for Very Low Water Vapor and Oxygen Transmission Rates Using Cheap Standard Plastic Substrates
M. Krug¹, S. Barth², I. Endler¹, D. Glöß², J. Fahlteich², C. Boeffel³, P. Frach²
¹    Fraunhofer IKTS [Germany]
²    Fraunhofer FEP [Germany]
³    Fraunhofer IAP [Germany]
12:20 – 12:40 Coating of High Quality Fluorine-doped Tin Oxide Film (FTO) on Glass Substrate through a Spray Pyrolysis Deposition
S. Kaneko, S. Ikoma, S. Ohta, P.V. V. Jayaweera
SPD Laboratory [Japan]
12:40 – 14:00 Lunch
Session 4 | Pre- and Post-Treatment for Flexible Glass and Polymers
»Functionalization, Strengthening, Patterning, Annealing«
Chairmen: Mr. R. Shimshock, Dr. T. Kälber
14:00 – 14:30
Glass on a Roll – from Glass to Coatings and Applications
U. Wilkens, M. Walther
SCHOTT AG [Germany]
14:30 – 14:50 Glass meets flexibility – Challenges in manufacturing of thin films on flexible glass
M. Junghähnel¹, S. Garner², T. Preußner¹, S. Weller¹, P. Cimo²
¹    Fraunhofer FEP [Germany]
²    Corning Incorporated [USA]
14:50 – 15:10
Pre- and Post Treatments for coating polymers in an industrial Roll Coater
R. Thielsch
Southwall Europe GmbH – an Eastman subsidiary, Depart. Process Engineering [Germany]
15:10 – 15:30
Influence of Substrate Type and Sputter gas Composition on Properties of Touch Sensor ITO Coatings with Various Doping Grades
P. Lippens, C. Frei
UMICORE Thin Film Products [Liechtenstein]
15:30 – 15:50 Flash Lamp Annealing: (sub)millisecond thermal treatment of layers on heat sensitive substrates
T. Gebel¹, M. Neubert¹, J. Weber¹, R. Endler¹ ², W. Skorupa²
¹    DTF Technology GmbH [Germany]
²    Helmholtz Zentrum Dresden Rossendorf (HZDR), Institute of Ion Beam Physics and Materials Research, Department “Semiconductors & New Materials” [Germany]
15:50 – 16:20 Coffee Break
16:20 – 16:40 Flash Lamp Annealing for Large Area Applications
H. Gross, O. Khvostikova, U. Willkommen
VON ARDENNE GmbH [Germany]
16:40 – 17:00 Clean4Yield, Enabling high yield R2R production of printed electronics
H. Rooms, J. Tripathi, M. Coenen, P. Groen
Holst Centre / TNO [The Netherlands]
17:00 – 18:30
Panel Discussion
How to get superior barrier properties?
What will be the appropriate substrate material in future?
Chairmen: Mr. R. Shimshock, Prof. B. Szyszka
Excellent barrier properties for thin film devices are an inevitable feature for many different applications. The functionalities of displays, flexible electronic devices or packaging are seriously affected by water vapor transmission rates or other species penetrating flexible substrates. This panel discussion will highlight such considerations with respect to improved barrier performance by choosing appropriate flexible substrates, including the choice between thinner glass vs. polymer films. Distinguished International Panelists will be continuing the discussions of topics raised and presented in Session 4.

Panel members
P. Fayet, TetraPak [Switzerland]
M. Prassas, Corning European Technology Center [France]
C. May, Fraunhofer COMEDD [Germany]
M. Liehr, W&L Coating Systems [Germany]
N. Schiller, Fraunhofer FEP [Germany]
H. Tamagaki, Kobelco, Kobe Steel [Japan]

18:30 – 21:00 Dresden Night
300 Years of MEISSEN® – 300 Years of Heritage and Innovation Porcelain, or “white gold”, has been fascinating us for centuries.The import of East Asian porcelain in the 16th century caused a frenzy of enthusiasm all over Europe. Augustus the Strong (1670 – 1733), elector of Saxony, even admitted that he was suffering from the “maladie de porcellaine.” And he was not the only one who had fallen victim to the addiction to the most delicate porcelain. All over Europe, attempts were made to uncover the secret of its production.
Dr. Peter Braun, head of the department historic collections, will be talking about the success of Meissen Porcelain®.

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